Specification of photomasks for contact lithography (design standards up to 0.35 μm)

Parameter Unit Specification
Scale - 5:1
Substrate material - Synthetic quartz
Size mm (152x152) ± 6,35 (6025)
Thickness mm 6,35 ± 0,13
Type of anti-reflective coating - Anti-reflective chrome (AR)
Single Position Sealed Cleanroom Container - yes
Optical protective membranes (pellicles) - yes / no (agreed with the customer)
Pellicle type - ASM07P-122-1017HFLC 109,0x86,00x5,00 mm ;
ASM14P-122-1017HFLC 147,00x126,00x4,75 mm ;
GCA04P-122-1017HFLC 97,50x97,50x6,05 mm ;
or other
Minimum size per template µm 1,2
Dimensional accuracy µm ± 0,1 / ± 0,05
Registration Accuracy µm 0,08
Homogeneity of critical dimensions nm no more than 70
Inadmissible defect size µm 0,4
Design - Photomasks design and preparation of control information based on initial topological information in OASIS, GDSII, DXF format
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