Laboratory of following physical and chemical properties

7 days
The term of the express analysis

Following of geometric, structural, optical and electrical properties of structures and materials

The laboratory provides control of the complete set of integrated circuit parameters (geometric, structural, optical, electrical) parameters throughout the entire cycle of their creation, starting with the development of the initial structure creation technology and ending with the research of the ready-made integrated circuits. Methods of operational control of reliability in the production of integrated circuits based on CVD structures have been developed and implemented on laboratory equipment. The laboratory is ready to provide services for conducting analytical studies on existing equipment

Monitoring geometric parameters
Contact profilometry
Optical and scanning electron microscopy
Photometry and ellipsometry
Monitoring OF THE RESISTIVITY OF MATERIALS BY THE FOUR-PROBE METHOD
Monitoring OF ELECTROPHYSICAL PROPERTIES OF ELEMENTS AND TEST STRUCTURES
Monitoring impurity composition
Secondary ion mass spectrometry
X-ray fluorescence spectroscopy
Energy dispersion spectroscopy

Related Services

Visualization and control of
geometrical parameters

  • Visualization of сircuit topology and cross-section elements;
  • Monitoring of linear dimensions;
  • Identification of defects in technological structural layers;
  • Precise sample preparation for microscopy and chemical analysis

Control of electrophysical parameters

  • Measurement of surface resistance of conductive materials by the four-probe method;
  • Control of electrophysical parameters of test structures (transistors, capacitors, diodes, metals, contact chains, inductance, etc.)

Elemental analysis by ICP-MS

  • Quantitative analysis of solutions in different matrices;
  • Diagnostics of impurities in high-purity materials;
  • Range of sample weights from 2 up to 260 a.e.m.;
  • Error of concentration measurement 0.02%

Analysis of the elemental composition

  • X-ray fluorescence spectroscopy

    - the range of detectable elements from B (bohr) to U (uranium)
    - detection limit reaches 0.2% at;
  • Energy-dispersive spectroscopy

    - ranges of registered elements: from 11Na up to 35Br, from 39Y up to 73Ta и 77Ir up to 92U;
    - ranges of elements whose concentration can be determined: from 11Na up to 30Zn (exception Si), from 45Rh up to 60Nd;
    - limit of permissible relative error of measurements of the surface concentration of chemical elements 12%)