Photomasks
Photomasks design and small-batch production for the production of integrated circuits with design rules up to 350 nm
Wafers
Small-batch production of silicon on insulator wafers a diameter of 150 and 200 mm with thin and thick layers
Tools
Production of technological equipment and metal products according to the customer's design documentation
Lab
Followng physical and chemical properties of structures and materials by the complete set of integrated circuit parameters: geometric, structural, optical, electrical
Design center
Development of electronic components using modern technologies in cooperation with leading manufacturers of integrated circuits in Russia
NVRAM
Development and research of technological directions for the creation of non-volatile memory using modern technologies