Photomasks for projection and contact photolithography
› Key specifications
Size of photo-masks:
• 152х152х6,35 mm (6025);
• 127х127х2,3 mm (5009)
Substrate material:
• synthetic quartz with masking antireflection chromium;
• alkaline glass with chromium;
Mask type: binary
Scale: 10:1, 5:1, 4:1, 1:1;
Overlapping accuracy: 70 nm;
Defect size: ≤ 0,3 µm;
Minimal size: 0,5 µm;
Dimensional tolerance: ±0,05 µm;
Uniformity of sizes: 60 nm;
Pellicles: (as agreed with the customer)
• single-sided – for reticle masks 6025;
• double-sided – for reticle masks 5009;
› List of proposed services:
Services for manufacturing photomasks
• Manufacturing VLSI reticles with design rules up to 0.35 µm in the scale 5:1 a d 4:1 for projection photolithography (ASML, Canon, Nikon);
• Manufacturing micron LSI reticles of the scale 5:1 for projection lithography (Planar);
• Manufacturing reticles of the scale 10:1 for step-and-repeat systems (AER);
• Manufacturing photomask of the scale 1:1 for contact photolithography.
Services for photomasks repair and certification
• Measuring linear dimensions and coordinates;
• Topology computerized testing by comparing with design data;
• Defect inspection;
• Defect laser repair;
• Pellicles replacement, including cleaning and re-certification.
E-mail address for obtaining detailed information on the said products and services: SVSmirnov@mvc-nn.ru
Contact person: Sergey Smirnov – Manager of Division for photomasks design and manufacturing